Stabilization of amorphous GaN by oxygen
Authors:
F. Budde,
B. J. Ruck,
A. Koo,
S. Granville,
H. J. Trodahl,
A. Bittar,
G. V. M. Williams,
M. J. Ariza,
B. Bonnet,
D. J. Jones,
J. B. Metson,
S. Rubanov,
P. Munroe
Abstract:
Ion assisted deposition (IAD) has been investigated for the growth of GaN, and the resulting films studied by x-ray diffraction and absorption spectroscopy and by transmission electron microscopy. IAD grown stoichiometric GaN consists of random-stacked quasicrystals of some 3 nm diameter. Amorphous material is formed only by incorporation of 15% or more oxygen, which we attribute to the presence…
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Ion assisted deposition (IAD) has been investigated for the growth of GaN, and the resulting films studied by x-ray diffraction and absorption spectroscopy and by transmission electron microscopy. IAD grown stoichiometric GaN consists of random-stacked quasicrystals of some 3 nm diameter. Amorphous material is formed only by incorporation of 15% or more oxygen, which we attribute to the presence of non-tetrahedral bonds centered on oxygen. The ionic favourability of heteropolar bonds and its strikingly simple constraint to even-membered rings is the likely cause of the instability of stoichiometric a-GaN.
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Submitted 26 July, 2004;
originally announced July 2004.