Time-frequency analysis assisted reconstruction of ruthenium optical constants in the sub-EUV spectral range 8nm-23.75nm
Authors:
Qais Saadeh,
Philipp Naujok,
Vicky Philipsen,
Philipp Hönicke,
Christian Laubis,
Christian Buchholz,
Anna Andrle,
Christian Stadelhoff,
Heiko Mentzel,
Anja Schönstedt,
Victor Soltwisch,
Frank Scholze
Abstract:
The optical constants of ruthenium in the spectral range 8 nm to 23.75 nm with their corresponding uncertainties are derived from the reflectance of a sputtered ruthenium thin film in the Extreme Ultraviolet (EUV) spectral range measured using monochromatized synchrotron radiation. This work emphasizes the correlation between structure modelling and the reconstructed optical parameters in a detail…
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The optical constants of ruthenium in the spectral range 8 nm to 23.75 nm with their corresponding uncertainties are derived from the reflectance of a sputtered ruthenium thin film in the Extreme Ultraviolet (EUV) spectral range measured using monochromatized synchrotron radiation. This work emphasizes the correlation between structure modelling and the reconstructed optical parameters in a detailed inverse-problem optimization strategy. Complementary X-ray Reflectivity (XRR) measurements are coupled with Markov chain Monte Carlo (MCMC) based Bayesian inferences and quasi-model-independent methods to create a model factoring the sample's oxidation, contamination, and surface roughness. The sensitivity of the modelling scheme is tested and verified against contamination and oxidation. A notable approach mitigating the high dimensionality of the reconstruction problem is elaborated with the results of this work compared to two previously published datasets. The presented dataset is of high interest for the continuing development of Extreme Ultraviolet Lithography (EUVL) and EUV astronomy optical systems.
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Submitted 22 March, 2021;
originally announced March 2021.
The anisotropy in the optical constants of quartz crystals for soft X-rays
Authors:
A. Andrle,
P. Hönicke,
J. Vinson,
R. Quintanilha,
Q. Saadeh,
S. Heidenreich,
F. Scholze,
V. Soltwisch
Abstract:
The refractive index of a y-cut SiO$_2$ crystal surface is reconstructed from polarization dependent soft X-ray reflectometry measurements in the energy range from 45 eV to 620 eV. Due to the anisotropy of the crystal structure in the (100) and (001) directions, we observe a significant deviation of the measured reflectance at the Si-L$_{2,3}$ and O-K absorption edges. The anisotropy in the optica…
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The refractive index of a y-cut SiO$_2$ crystal surface is reconstructed from polarization dependent soft X-ray reflectometry measurements in the energy range from 45 eV to 620 eV. Due to the anisotropy of the crystal structure in the (100) and (001) directions, we observe a significant deviation of the measured reflectance at the Si-L$_{2,3}$ and O-K absorption edges. The anisotropy in the optical constants reconstructed from these data is also confirmed by ab initio Bethe-Salpeter Equation calculations of the O-K edge. This new experimental dataset expands the existing literature data for quartz optical constants significantly, particularly in the near-edge regions.
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Submitted 8 October, 2020;
originally announced October 2020.
