UV photodetectors and field-effect transistors based on $β$-Ga$_2$O$_3$ nanomembranes produced by ion-beam-assisted exfoliation
Authors:
Miguel Cardoso Pedro,
Duarte Magalhães Esteves,
Daniela Rodrigues Pereira,
Luís Cerqueira Alves,
Chamseddine Bouhafs,
Katharina Lorenz,
Marco Peres
Abstract:
$β$-Ga$_{2}$O$_{3}…
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$β$-Ga$_{2}$O$_{3}$ nanomembranes, obtained by ion-beam-assisted exfoliation, are used in the fabrication of simple metal-semiconductor-metal (MSM) structures, that are tested as photodetectors (PD) and field-effect transistors (FET). Ti/Au contacts to the membrane are found to be rectifying. However, through thermal treatment in a nitrogen atmosphere for one minute at 500 °C, it is possible to modify this junction to have an ohmic behavior. An MSM PD is studied, reaching a high responsivity of 2.6$\times$10$^{4}$ A/W and a detectivity of 2.4$\times$10$^{14}$ Jones, under 245 nm wavelength illumination, and an applied voltage of 40 V. In order to better understand the behavior of the two junctions, in particular the iono/photocurrent mechanisms, an ion microprobe system is used to assess the response of these PD when excitation is localized in the different regions of the device. Finally, a depletion-mode FET is obtained, with an on/off current ratio of 7.7$\times$10$^{7}$ in the linear regime, at a drain-to-source voltage of 5 V, and with a threshold voltage around $-$3 V. The success in obtaining FET, and most notably, MSM photodetectors, while using a simple device structure, indicates a great potential of the nanomembranes produced by ion-beam-assisted exfoliation for the development of high-performance devices.
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Submitted 18 February, 2025;
originally announced February 2025.
Electrical and Optical Properties of Heavily Ge-Doped AlGaN
Authors:
R. Blasco,
A. Ajay,
E. Robin,
C. Bougerol,
K. Lorentz,
L. C. Alves,
I. Mouton,
L. Amichi,
A. Grenier,
E. Monroy
Abstract:
We report the effect of germanium as n-type dopant on the electrical and optical properties of AlxGa1-xN layers grown by plasma assisted molecular-beam epitaxy. The Al content has been varied from x = 0 to 0.66, confirmed by Rutherford backscattering spectrometry, and the Ge concentration was increased up to [Ge] = 1E21 cm-3. Even at these high doping levels Ge does not induce any structural degra…
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We report the effect of germanium as n-type dopant on the electrical and optical properties of AlxGa1-xN layers grown by plasma assisted molecular-beam epitaxy. The Al content has been varied from x = 0 to 0.66, confirmed by Rutherford backscattering spectrometry, and the Ge concentration was increased up to [Ge] = 1E21 cm-3. Even at these high doping levels Ge does not induce any structural degradation in AlxGa1-xN layers with x below 0.15. However, for higher Al compositions, clustering of Ge forming crystallites were observed. Hall effect measurements show a gradual decrease of the carrier concentration when increasing the Al mole fraction, which is already noticeable in samples with x = 0.24. Samples with x = 0.64-0.66 remain conductive, but the donor activation rate drops to around 0.1% (carrier concentration around 1E18 cm-3 for [Ge] = 1E21 cm-3). From the optical point of view, the low temperature photoluminescence is dominated by the band-to-band emission, which show only spectral shift and broadening associated to the Burstein-Moss effect. The evolution of the photoluminescence peak position with temperature shows that the free carriers due to Ge doping can efficiently screen the potential fluctuations induced by alloy disorder.
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Submitted 13 December, 2018; v1 submitted 25 October, 2018;
originally announced October 2018.
