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Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen
Authors:
D. I. Astakhov,
W. J. Goedheer,
C. J. Lee,
V. V. Ivanov,
V. M. Krivtsun,
K. N. Koshelev,
D. V. Lopaev,
R. M. van der Horst,
J. Beckers,
E. A. Osorio,
F. Bijkerk
Abstract:
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spe…
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We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.
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Submitted 26 March, 2016;
originally announced March 2016.
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Exploring the electron density in plasmas induced by extreme ultraviolet radiation in argon
Authors:
R. M. van der Horst,
J. Beckers,
E. A. Osorio,
V. Y. Banine
Abstract:
The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impact on the highly delicate mirrors It is essential to characterize these kinds of EUV-induced plasmas. We measured the electron density evolution in argon gas during and just after irradiation by a short pulse of EUV light…
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The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impact on the highly delicate mirrors It is essential to characterize these kinds of EUV-induced plasmas. We measured the electron density evolution in argon gas during and just after irradiation by a short pulse of EUV light at 13.5 nm by applying microwave cavity resonance spectroscopy. Dependencies on EUV pulse energy and gas pressure have been explored over a range relevant for industrial applications.
Our experimental results show that the maximum reached electron density depends linearly on pulse energy. A quadratic dependence - caused by photoionization and subsequent electron impact ionization by free electrons - is found from experiments where the gas pressure is varied. This is demonstrated by our theoretical estimates presented in this manuscript as well.
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Submitted 31 March, 2015;
originally announced March 2015.
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Time-resolved OES of nanosecond pulsed discharges in N$_{2}$ and N$_{2}$/H$_{2}$O mixtures]{Time-resolved optical emission spectroscopy of nanosecond pulsed discharges in atmospheric pressure N$_{2}$ and N$_{2}$/H$_{2}$O mixtures
Authors:
R. M. van der Horst,
T. Verreycken,
E. M. van Veldhuizen,
P. J. Bruggeman
Abstract:
In this contribution, nanosecond pulsed discharges in N$_{2}$ and N$_{2}$/0.9% H$_{2}$O at atmospheric pressure (at 300 K) are studied with time-resolved imaging, optical emission spectroscopy and Rayleigh scattering. A 170 ns high voltage pulse is applied across two pin-shaped electrodes at a frequency of 1 kHz. The discharge consists of three phases: an ignition phase, a spark phase and a recomb…
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In this contribution, nanosecond pulsed discharges in N$_{2}$ and N$_{2}$/0.9% H$_{2}$O at atmospheric pressure (at 300 K) are studied with time-resolved imaging, optical emission spectroscopy and Rayleigh scattering. A 170 ns high voltage pulse is applied across two pin-shaped electrodes at a frequency of 1 kHz. The discharge consists of three phases: an ignition phase, a spark phase and a recombination phase. During the ignition phase the emission is mainly caused by molecular nitrogen (N$_{2}$(C-B)). In the spark and recombination phase mainly atomic nitrogen emission is observed. The emission when H$_{2}$O is added is very similar, except the small contribution of H$_α$ and the intensity of the molecular N$_{2}$(C-B) emission is less.
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Submitted 20 March, 2014;
originally announced March 2014.
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Exploring the temporally resolved electron density evolution in EUV induced plasmas
Authors:
R. M. van der Horst,
J. Beckers,
S. Nijdam,
G. M. W. Kroesen
Abstract:
We measured for the first time the electron density in an Extreme Ultra-Violet induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density just after the EUV pulse is $2.6\cdot10^{16}$ m$^{-3}$. This is in good agreement with a theoretical prediction from photo ionization, which yields a density of…
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We measured for the first time the electron density in an Extreme Ultra-Violet induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density just after the EUV pulse is $2.6\cdot10^{16}$ m$^{-3}$. This is in good agreement with a theoretical prediction from photo ionization, which yields a density of $4.5\cdot10^{16}$ m$^{-3}$. After the EUV pulse the density slightly increase due to electron impact ionization. The plasma (i.e. electron density) decays in tens of microseconds.
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Submitted 4 July, 2014; v1 submitted 19 March, 2014;
originally announced March 2014.
