-
Cryogenic rf test of the first plasma etched SRF cavity
Authors:
J. Upadhyay,
A. Palczewski,
S. Popović,
A. -M. Valente-Feliciano,
D. Im,
L. Phillips,
L. Vušković
Abstract:
Plasma etching has a potential to be an alternative processing technology for superconducting radio frequency (SRF) cavities. An apparatus and a method are developed for plasma etching of the inner surfaces of SRF cavities. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used. The single cell cavity is mechanically polished, buffer chemic…
▽ More
Plasma etching has a potential to be an alternative processing technology for superconducting radio frequency (SRF) cavities. An apparatus and a method are developed for plasma etching of the inner surfaces of SRF cavities. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used. The single cell cavity is mechanically polished, buffer chemically etched afterwards and rf tested at cryogenic temperatures for a baseline test. This cavity is then plasma processed. The processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise manner to establish segmented plasma processing. The cavity is rf tested afterwards at cryogenic temperatures. The rf test and surface condition results are presented.
△ Less
Submitted 20 May, 2016;
originally announced May 2016.
-
Reversal of the Asymmetry in a Cylindrical Coaxial Capacitively Coupled Ar/Cl2 Plasma
Authors:
J. Upadhyay,
Do Im,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vušković
Abstract:
The reduction of the asymmetry in the plasma sheath voltages of a cylindrical coaxial capacitively coupled plasma is crucial for efficient surface modification of the inner surfaces of concave three-dimensional structures, including superconducting radio frequency cavities. One critical asymmetry effect is the negative dc self-bias, formed across the inner electrode plasma sheath due to its lower…
▽ More
The reduction of the asymmetry in the plasma sheath voltages of a cylindrical coaxial capacitively coupled plasma is crucial for efficient surface modification of the inner surfaces of concave three-dimensional structures, including superconducting radio frequency cavities. One critical asymmetry effect is the negative dc self-bias, formed across the inner electrode plasma sheath due to its lower surface area compared to the outer electrode. The effect on the self-bias potential with the surface enhancement by geometric modification on the inner electrode structure is studied. The shapes of the inner electrodes are chosen as cylindrical tube, large and small pitch bellows, and disc-loaded corrugated structure (DLCS). The dc self-bias measurements for all these shapes were taken at different process parameters in Ar/Cl2 discharge. The reversal of the negative dc self-bias potential to become positive for a DLCS inner electrode was observed and the best etch rate is achieved due to the reduction in plasma asymmetry.
△ Less
Submitted 30 June, 2015;
originally announced July 2015.
-
Self-bias Dependence on Process Parameters in Asymmetric Cylindrical Coaxial Capacitively Coupled Plasma
Authors:
J. Upadhyay,
Do Im,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vušković
Abstract:
An rf coaxial capacitively coupled Ar/Cl2 plasma is applied to processing the inner wall of superconducting radio frequency cavities. A dc self-bias potential is established across the inner electrode sheath due to the surface area difference between inner and outer electrodes of the coaxial plasma. The self-bias potential measurement is used as an indication of the plasma sheath voltage asymmetry…
▽ More
An rf coaxial capacitively coupled Ar/Cl2 plasma is applied to processing the inner wall of superconducting radio frequency cavities. A dc self-bias potential is established across the inner electrode sheath due to the surface area difference between inner and outer electrodes of the coaxial plasma. The self-bias potential measurement is used as an indication of the plasma sheath voltage asymmetry. The understanding of the asymmetry in sheath voltage distribution in coaxial plasma is important for the modification of the inner surfaces of three dimensional objects. The plasma sheath voltages were tailored to process the outer wall by providing an additional dc current to the inner electrode with the help of an external dc power supply. The dc self-bias potential is measured for different diameter electrodes and its variation on process parameters such as gas pressure, rf power and percentage of chlorine in the Ar/Cl2 gas mixture is studied. The dc current needed to overcome the self-bias potential to make it zero is measured for the same process parameters.
△ Less
Submitted 16 June, 2015;
originally announced June 2015.
-
Etching Mechanism of Niobium in Coaxial Ar/Cl2 RF Plasma
Authors:
J. Upadhyay,
Do Im,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vušković
Abstract:
The understanding of the Ar/Cl2 plasma etching mechanism is crucial for the desired modification of inner surface of the three dimensional niobium (Nb) superconductive radio frequency cavities. Uniform mass removal in cylindrical shaped structures is a challenging task, because the etch rate varies along the direction of gas flow. The study is performed in the asymmetric coaxial RF discharge with…
▽ More
The understanding of the Ar/Cl2 plasma etching mechanism is crucial for the desired modification of inner surface of the three dimensional niobium (Nb) superconductive radio frequency cavities. Uniform mass removal in cylindrical shaped structures is a challenging task, because the etch rate varies along the direction of gas flow. The study is performed in the asymmetric coaxial RF discharge with two identical Nb rings acting as a part of the outer electrode. The dependence of etch rate uniformity on pressure, RF power, DC bias, Cl2 concentration, diameter of the inner electrode, temperature of the outer cylinder and position of the samples in the structure is determined. To understand the plasma etching mechanisms, we have studied several factors that have important influence on the etch rate and uniformity, which include the plasma sheath potential, Nb surface temperature, and the gas flow rate.
△ Less
Submitted 1 November, 2014;
originally announced November 2014.
-
Plasma Processing of Large Curved Surfaces for SRF Cavity Modification
Authors:
J. Upadhyay,
Do Im,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vušković
Abstract:
Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which influence the etching rate and surface roughness, and eventually, determine cavity performance. This includes dependence of the process on the freque…
▽ More
Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which influence the etching rate and surface roughness, and eventually, determine cavity performance. This includes dependence of the process on the frequency of the RF generator, gas pressure, power level, the driven (inner) electrode configuration, and the chlorine concentration in the gas mixture during plasma processing. To demonstrate surface layer removal in the asymmetric non-planar geometry, we are using a simple cylindrical cavity with 8 ports symmetrically distributed over the cylinder. The ports are used for diagnosing the plasma parameters and as holders for the samples to be etched. The etching rate is highly correlated with the shape of the inner electrode, radio-frequency (RF) circuit elements, chlorine concentration in the Cl2/Ar gas mixtures, residence time of reactive species and temperature of the cavity. Using cylindrical electrodes with variable radius, large-surface ring-shaped samples and d.c. bias implementation in the external circuit we have demonstrated substantial average etching rates and outlined the possibility to optimize plasma properties with respect to maximum surface processing effect.
△ Less
Submitted 1 November, 2014;
originally announced November 2014.
-
On Wheeler's delayed-choice Gedankenexperiment and its laboratory realization
Authors:
M. Bozic,
L. Vuskovic,
M. Davidovic,
A. S. Sanz
Abstract:
Here, we present an analysis and interpretation of the experiment performed by Jacques et al. (2007 Science 315, 966), which represents a realization of Wheeler's delayed-choice Gedankenexperiment. Our analysis is based on the evolution of the photon state, since the photon enters into the Mach-Zehnder interferometer with a removable beam-splitter until it exits. Given the same incident photon sta…
▽ More
Here, we present an analysis and interpretation of the experiment performed by Jacques et al. (2007 Science 315, 966), which represents a realization of Wheeler's delayed-choice Gedankenexperiment. Our analysis is based on the evolution of the photon state, since the photon enters into the Mach-Zehnder interferometer with a removable beam-splitter until it exits. Given the same incident photon state onto the output beam-splitter, BS_output, the photon's state at the exit will be very different depending on whether BS_output is on or off. Hence, the statistics of photon counts collected by the two detectors, positioned along orthogonal directions at the exit of the interferometer, is also going to be very different in either case. Therefore, it is not that the choice of inserting (on) or removing (off) a beam-splitter leads to a delayed influence on the photon behavior before arriving at the beam-splitter, but that such a choice influences the photon state at and after BS_output, i.e., after it has exited from the Mach-Zehnder interferometer. The random on/off choice at BS_output has no delayed effect on the photon to behave as a wave or a corpuscle at the entrance and inside the interferometer, but influences the subsequent evolution of the photon state incident onto BS_output.
△ Less
Submitted 28 February, 2011; v1 submitted 7 January, 2011;
originally announced January 2011.
-
An asymmetric double-slit interferometer for small and large quantum particles
Authors:
Mirjana Bozic,
Dusan Arsenovic,
Lepsa Vuskovic
Abstract:
Quantum theory of interference phenomena does not take the diameter of the particle into account, since particles were much smaller than the width of the slits in early observations. In recent experiments with large molecules, the diameter of the particle has approached the width of the slits. Therefore, analytical description of these cases should include a finite particle size. The generic qua…
▽ More
Quantum theory of interference phenomena does not take the diameter of the particle into account, since particles were much smaller than the width of the slits in early observations. In recent experiments with large molecules, the diameter of the particle has approached the width of the slits. Therefore, analytical description of these cases should include a finite particle size. The generic quantum interference setup is an asymmetric double slit interferometer. We evaluate the wave function of the particle transverse motion using two forms of the solution of Schrodinger's equation in an asymmetric interferometer: the Fresnel-Kirchhoff form and the form derived from the transverse wave function in the momentum representation. The transverse momentum distribution is independent of the distance from the slits, while the space distribution strongly depends on this distance. Based on the transverse momentum distribution we determined the space distribution of particles behind the slits. We will present two cases: a) when the diameter of the particle may be neglected with respect to the width of both slits, and b) when the diameter of the particle is larger than the width of the smaller slit.
△ Less
Submitted 30 May, 2003;
originally announced May 2003.
-
Non-classical behavior of atoms in an interferometer
Authors:
Lepsa Vuskovic,
Dusan Arsenovic,
Mirjana Bozic
Abstract:
We have studied the properties of the non-classical behavior of atoms in a double-slit interferometer. An indication of this behavior for metastable helium was reported by Kurtsiefer, Pfau and Mlynek [Nature 386, 150 (1997)] showing distinctive negative values of the Wigner function, which was reconstructed from the measured diffraction data. Our approach to explain this non-classical behavior i…
▽ More
We have studied the properties of the non-classical behavior of atoms in a double-slit interferometer. An indication of this behavior for metastable helium was reported by Kurtsiefer, Pfau and Mlynek [Nature 386, 150 (1997)] showing distinctive negative values of the Wigner function, which was reconstructed from the measured diffraction data. Our approach to explain this non-classical behavior is based on the de Broglie-Bohm-Vigier-Selleri understanding of the wave-particle duality and compatible statistical interpretation of the atomic wave function. It follows from the results that the atomic motion is non-classical because it does not obey the laws of classical mechanics. However, there is no evidence that this atomic behavior violates the classical probability law of the addition of probabilities.
△ Less
Submitted 25 May, 2001;
originally announced May 2001.
