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Local doping of an oxide semiconductor by voltage-driven splitting of anti-Frenkel defects
Authors:
Jiali He,
Ursula Ludacka,
Kasper A. Hunnestad,
Didrik R. Småbråten,
Konstantin Shapovalov,
Per Erik Vullum,
Constantinos Hatzoglou,
Donald M. Evans,
Erik D. Roede,
Zewu Yan,
Edith Bourret,
Sverre M. Selbach,
David Gao,
Jaakko Akola,
Dennis Meier
Abstract:
Layered oxides exhibit high ionic mobility and chemical flexibility, attracting interest as cathode materials for lithium-ion batteries and the pairing of hydrogen production and carbon capture. Recently, layered oxides emerged as highly tunable semiconductors. For example, by introducing anti-Frenkel defects, the electronic hopping conductance in hexagonal manganites was increased locally by orde…
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Layered oxides exhibit high ionic mobility and chemical flexibility, attracting interest as cathode materials for lithium-ion batteries and the pairing of hydrogen production and carbon capture. Recently, layered oxides emerged as highly tunable semiconductors. For example, by introducing anti-Frenkel defects, the electronic hopping conductance in hexagonal manganites was increased locally by orders of magnitude. Here, we demonstrate local acceptor and donor doping in Er(Mn,Ti)O$_3$, facilitated by the splitting of such anti-Frenkel defects under applied d.c. voltage. By combining density functional theory calculations, scanning probe microscopy, atom probe tomography, and scanning transmission electron microscopy, we show that the oxygen defects readily move through the layered crystal structure, leading to nano-sized interstitial-rich (p-type) and vacancy-rich (n-type) regions. The resulting pattern is comparable to dipolar npn-junctions and stable on the timescale of days. Our findings reveal the possibility of temporarily functionalizing oxide semiconductors at the nanoscale, giving additional opportunities for the field of oxide electronics and the development of transient electronics in general.
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Submitted 11 February, 2025;
originally announced February 2025.
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Tuning thermoelectric properties of Sb$_2$Te$_3$-AgSbTe$_2$ nanocomposite thin film -- synergy of band engineering and heat transport modulation
Authors:
Abhishek Ghosh,
Khushboo Agarwal,
Sergio Gonzalez Munoz,
Prashant Bisht,
Chandan K Vishwakarma,
Narinder Kaur,
Mujeeb Ahmad,
Per Erik Vullum,
Branson D. Belle,
Rajendra Singh,
O. V. Kolosov,
Bodh Raj Mehta
Abstract:
The present study demonstrates a large enhancement in the Seebeck coefficient and ultralow thermal conductivity (TE) in Sb$_2$Te$_3$-AgSbTe$_2$ nanocomposite thin film. The addition of Ag leads to the in-situ formation of AgSbTe$_2$ secondary phase nanoaggregates in the Sb$_2$Te$_3$ matrix during the growth resulting in a large Seebeck coefficient and reduction of the thermal conductivity. A serie…
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The present study demonstrates a large enhancement in the Seebeck coefficient and ultralow thermal conductivity (TE) in Sb$_2$Te$_3$-AgSbTe$_2$ nanocomposite thin film. The addition of Ag leads to the in-situ formation of AgSbTe$_2$ secondary phase nanoaggregates in the Sb$_2$Te$_3$ matrix during the growth resulting in a large Seebeck coefficient and reduction of the thermal conductivity. A series of samples with different amounts of minor AgSbTe$_2$ phases are prepared to optimize the TE performance of Sb$_2$Te$_3$ thin films. Based on the experimental and theoretical evidence, it is concluded that a small concentration of Ag promotes the band flattening and induces a sharp resonate-like state deep inside the valence band of Sb$_2$Te$_3$, concurrently modifying the density of states (DOS) of the composite sample. In addition, the electrical potential barrier introduced by the band offset between the host TE matrix and the secondary phases promotes strong energy-dependent carrier scattering in the composite sample, which is also responsible for enhanced TE performance. A contemporary approach based on scanning thermal microscopy is performed to experimentally obtain thermal conductivity values of both the in-plane and cross-plane directions, showing a reduced in-plane thermal conductivity value by ~ 58% upon incorporating the AgSbTe$_2$ phase in the Sb$_2$Te$_3$ matrix. Benefitting from the synergistic manipulation of electrical and thermal transport, a large ZT value of 2.2 is achieved at 375 K. The present study indicates the importance of a combined effect of band structure modification and energy-dependent charge carrier scattering along with reduced thermal conductivity for enhancing TE properties.
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Submitted 30 May, 2023;
originally announced May 2023.
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Atomic-scale 3D imaging of individual dopant atoms in a complex oxide
Authors:
K. A. Hunnestad,
C. Hatzoglou,
Z. M. Khalid,
P. E. Vullum,
Z. Yan,
E. Bourret,
A. T. J. van Helvoort,
S. M. Selbach,
D. Meier
Abstract:
A small percentage of dopant atoms can completely change the physical properties of the host material. For example, chemical doping controls the electronic transport behavior of semiconductors and gives rise to a wide range of emergent electric and magnetic phenomena in oxides. Imaging of individual dopant atoms in lightly doped systems, however, remains a major challenge, hindering characterizati…
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A small percentage of dopant atoms can completely change the physical properties of the host material. For example, chemical doping controls the electronic transport behavior of semiconductors and gives rise to a wide range of emergent electric and magnetic phenomena in oxides. Imaging of individual dopant atoms in lightly doped systems, however, remains a major challenge, hindering characterization of the site-specific effects and local dopant concentrations that determine the atomic-scale physics. Here, we apply atom-probe tomography (APT) to resolve individual Ti atoms in the narrow band gap semiconductor ErMnO3 with a nominal proportion of 0.04 atomic percent. Our 3D imaging measures the Ti concentration at the unit cell level, providing quantitative information about the dopant distribution within the ErMnO3 crystal lattice. High-resolution APT maps reveal the 3D lattice position of individual Ti atoms, showing that they are located within the Mn layers with no signs of clustering or other chemical inhomogeneities. The 3D atomic-scale visualization of individual dopant atoms provides new opportunities for the study of local structure-property relations in complex oxides, representing an important step toward controlling dopant-driven quantum phenomena in next-generation oxide electronics.
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Submitted 30 October, 2021;
originally announced November 2021.
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Controlling local resistance via electric-field induced dislocations
Authors:
D. M. Evans,
D. R. Småbråten,
T. S. Holstad,
P. E. Vullum,
A. B. Mosberg,
Z. Yan,
E. Bourret,
A. T. J. Van Helvoort,
S. M. Selbach,
D. Meier
Abstract:
Dislocations are one-dimensional (1D) topological line defects where the lattice deviates from the perfect crystal structure. The presence of dislocations transcends condensed matter research and gives rise to a diverse range of emergent phenomena [1-6], ranging from geological effects [7] to light emission from diodes [8]. Despite their ubiquity, to date, the controlled formation of dislocations…
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Dislocations are one-dimensional (1D) topological line defects where the lattice deviates from the perfect crystal structure. The presence of dislocations transcends condensed matter research and gives rise to a diverse range of emergent phenomena [1-6], ranging from geological effects [7] to light emission from diodes [8]. Despite their ubiquity, to date, the controlled formation of dislocations is usually achieved via strain fields, applied either during growth [9,10] or retrospectively via deformation, e.g., (nano [11-14])-indentation [15]. Here we show how partial dislocations can be induced using local electric fields, altering the structure and electronic response of the material where the field is applied. By combining high-resolution imaging techniques and density functional theory calculations, we directly image these dislocations in the ferroelectric hexagonal manganite Er(Ti,Mn)O3 and study their impact on the local electric transport behaviour. The use of an electric field to induce partial dislocations is a conceptually new approach to the burgeoning field of emergent defect-driven phenomena and enables local property control without the need of external macroscopic strain fields. This control is an important step towards integrating and functionalising dislocations in practical devices for future oxide electronics.
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Submitted 26 June, 2020;
originally announced June 2020.
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Quantitative strain analysis of InAs/GaAs quantum dot materials
Authors:
Per Erik Vullum,
Magnus Nord,
Maryam Vatanparast,
Sedsel Fretheim Thomassen,
Chris Boothroyd,
Randi Holmestad,
Bjorn-Ove Fimland,
Turid Worren Reenaas
Abstract:
Geometric phase analysis has been applied to high resolution aberration corrected (scanning) transmission electron microscopy images of InAs/GaAs quantum dot (QD) materials. We show quantitatively how the lattice mismatch induced strain varies on the atomic scale and tetragonally distorts the lattice in a wide region that extends several nanometers into the GaAs spacer layer below and above the QD…
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Geometric phase analysis has been applied to high resolution aberration corrected (scanning) transmission electron microscopy images of InAs/GaAs quantum dot (QD) materials. We show quantitatively how the lattice mismatch induced strain varies on the atomic scale and tetragonally distorts the lattice in a wide region that extends several nanometers into the GaAs spacer layer below and above the QDs. Finally, we show how V-shaped dislocations originating at the QD/GaAs interface efficiently remove most of the lattice mismatch induced tetragonal distortions in and around the QD.
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Submitted 27 November, 2016;
originally announced November 2016.
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Bandgap measurement of high refractive index materials by off-axis EELS
Authors:
Maryam Vatanparast,
Ricardo Egoavil,
Turid W. Reenaas,
Johan Verbeeck,
Randi Holmestad,
Per Erik Vullum
Abstract:
In the present work, Cs aberration corrected and monochromated scanning transmission electron microscopy electron energy loss spectroscopy STEM-EELS has been used to explore experimental set-ups that allows bandgaps of high refractive index materials to be determined. Semi-convergence and -collection angles in the micro-radian range were combined with off-axis or dark field EELS to avoid relativis…
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In the present work, Cs aberration corrected and monochromated scanning transmission electron microscopy electron energy loss spectroscopy STEM-EELS has been used to explore experimental set-ups that allows bandgaps of high refractive index materials to be determined. Semi-convergence and -collection angles in the micro-radian range were combined with off-axis or dark field EELS to avoid relativistic losses and guided light modes in the low loss range to contribute to the acquired EEL spectra. Off-axis EELS further suppressed the zero loss peak and the tail of the zero loss peak. The bandgap of several GaAs-based materials were successfully determined by direct inspection and without any background subtraction of the EEL spectra. The presented set-up does not require that the acceleration voltage is set to below the Cerenkov limit and can be applied over the entire acceleration voltage range of modern TEMs and for a wide range of specimen thicknesses.
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Submitted 30 September, 2016;
originally announced September 2016.
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Assessing electron beam sensitivity for SrTiO$_3$ and La$_{0.7}$Sr$_{0.3}$MnO$_3$ using electron energy loss spectroscopy
Authors:
Magnus Nord,
Per Erik Vullum,
Ingrid Hallsteinsen,
Thomas Tybell,
Randi Holmestad
Abstract:
Thresholds for beam damage have been assessed for La$_{0.7}$Sr$_{0.3}$MnO$_3$ and SrTiO$_3$ as a function of electron probe current and exposure time at 80 and 200 kV acceleration voltage. The materials were exposed to an intense electron probe by aberration corrected scanning transmission electron microscopy (STEM) with simultaneous acquisition of electron energy loss spectroscopy (EELS) data. El…
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Thresholds for beam damage have been assessed for La$_{0.7}$Sr$_{0.3}$MnO$_3$ and SrTiO$_3$ as a function of electron probe current and exposure time at 80 and 200 kV acceleration voltage. The materials were exposed to an intense electron probe by aberration corrected scanning transmission electron microscopy (STEM) with simultaneous acquisition of electron energy loss spectroscopy (EELS) data. Electron beam damage was identified by changes of the core loss fine structure after quantification by a refined and improved model based approach. At 200 kV acceleration voltage, damage in SrTiO$_3$ was identified by changes both in the EEL fine structure and by contrast changes in the STEM images. However, the changes in the STEM image contrast as introduced by minor damage can be difficult to detect under several common experimental conditions. No damage was observed in SrTiO$_3$ at 80 kV acceleration voltage, independent of probe current and exposure time. In La$_{0.7}$Sr$_{0.3}$MnO$_3$, beam damage was observed at both 80 and 200 kV acceleration voltages. This damage was observed by large changes in the EEL fine structure, but not by any detectable changes in the STEM images. The typical method to validate if damage has been introduced during acquisitions is to compare STEM images prior to and after spectroscopy. Quantifications in this work show that this method possibly can result in misinterpretation of beam damage as changes of material properties.
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Submitted 28 August, 2016;
originally announced August 2016.
