Gating monolayer and bilayer graphene with a two-dimensional semiconductor
Authors:
Randy Sterbentz,
Bogyeom Kim,
Anayeli Flores-Garibay,
Kristine L. Haley,
Nicholas T. Pereira,
Kenji Watanabe,
Takashi Taniguchi,
Joshua O. Island
Abstract:
Metals are commonly used as electrostatic gates in devices due to their abundant charge carrier densities that are necessary for efficient charging and discharging. A semiconducting gate can be beneficial for certain fabrication processes, in low light conditions, and for specific gating properties. We determine the effectiveness and limitations of a semiconducting gate in graphene and bilayer gra…
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Metals are commonly used as electrostatic gates in devices due to their abundant charge carrier densities that are necessary for efficient charging and discharging. A semiconducting gate can be beneficial for certain fabrication processes, in low light conditions, and for specific gating properties. We determine the effectiveness and limitations of a semiconducting gate in graphene and bilayer graphene devices. Using the semiconducting transition metal dichalcogenides molybdenum disulfide (MoS2), molybdenum diselenide (MoSe2), tungsten disulfide (WS2), and tungsten diselenide (WSe2), we show that two-dimensional semiconductors can be used to suitably gate the graphene devices under appropriate operating conditions. For single-gated devices, semiconducting gates are comparable to metallic gates below liquid helium temperatures but include resistivity features resulting from gate voltage clamping of the semiconductor. In dual-gated devices, we pin down the parameter range of effective operation and find that the semiconducting depletion regime results in clamping and hysteresis from defect-state charge trapping.
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Submitted 11 April, 2025; v1 submitted 8 October, 2024;
originally announced October 2024.
Isolation and characterization of atomically thin mica phyllosilicates
Authors:
Kristine L. Haley,
Noah F. Lee,
Vergil M. Schreiber,
Nicholas T. Pereira,
Randy M. Sterbentz,
Timothy Y. Chung,
Joshua O. Island
Abstract:
One of the roadblocks to employing two-dimensional (2D) materials in next generation devices is the lack of high quality insulators. Insulating layered materials with inert and atomically flat surfaces are ideal for high performance transistors and this has been exemplified with commonly used boron nitride. While the list of insulating 2D materials is limited, the earth-abundant phyllosilicates ar…
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One of the roadblocks to employing two-dimensional (2D) materials in next generation devices is the lack of high quality insulators. Insulating layered materials with inert and atomically flat surfaces are ideal for high performance transistors and this has been exemplified with commonly used boron nitride. While the list of insulating 2D materials is limited, the earth-abundant phyllosilicates are particularly attractive candidates. Here, we investigate the properties of atomically thin biotite and muscovite, the most common and commercially important micas from the rock-forming minerals. From a group of five natural bulk samples, energy dispersive X-ray spectroscopy is used to classify exfoliated flakes into three types of biotite, including the phlogopite endmember, and two muscovites. We provide a catalog of RGB contrast values for exfoliated flakes ranging from bilayer to approximately 175 nm. Additionally, we report the complex index of refraction for all investigated materials based on micro-reflectance measurements. Our findings suggest that earth-abundant phyllosilicates could serve as scalable insulators for logic devices employing 2D materials, potentially overcoming current limitations in the field.
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Submitted 23 August, 2024;
originally announced August 2024.
