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Achieving 100% amplitude modulation depth in a graphene-based tuneable capacitance metamaterial
Authors:
Ruqiao Xia,
Nikita W. Almond,
Stephen J. Kindness,
Sergey A. Mikhailov,
Wadood Tadbier,
Riccardo Degl'Innocenti,
Yuezhen Lu,
Abbie Lowe,
Ben Ramsay,
Lukas A. Jakob,
James Dann,
Stephan Hofmann,
Harvey E. Beere,
David A. Ritchie,
Wladislaw Michailow
Abstract:
Effective control of terahertz radiation requires the development of efficient and fast modulators with a large modulation depth. This challenge is often tackled by using metamaterials, artificial sub-wavelength optical structures engineered to resonate at the desired terahertz frequency. Metamaterial-based devices exploiting graphene as the active tuneable element have been proven to be a highly…
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Effective control of terahertz radiation requires the development of efficient and fast modulators with a large modulation depth. This challenge is often tackled by using metamaterials, artificial sub-wavelength optical structures engineered to resonate at the desired terahertz frequency. Metamaterial-based devices exploiting graphene as the active tuneable element have been proven to be a highly effective solution for THz modulation. However, whilst the graphene conductivity can be tuned over a wide range, it cannot be reduced to zero due to the gapless nature of graphene, which directly limits the maximum achievable modulation depth for single-layer metamaterial modulators. Here, we demonstrate two novel solutions to circumvent this restriction: Firstly, we excite the modulator from the back of the substrate, and secondly, we incorporate air gaps into the graphene patches. This results in a ground-breaking graphene-metal metamaterial terahertz modulator, operating at 2.0-2.5 THz, which demonstrates a 99.01 % amplitude and a 99.99 % intensity modulation depth at 2.15 THz, with a reconfiguration speed in excess of 3 MHz. Our results open up new frontiers in the area of terahertz technology.
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Submitted 26 December, 2023;
originally announced December 2023.
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Theory of the in-plane photoelectric effect in two-dimensional electron systems
Authors:
S. A. Mikhailov,
W. Michailow,
H. E. Beere,
D. A. Ritchie
Abstract:
A new photoelectric phenomenon, the in-plane photoelectric (IPPE) effect, has been recently discovered at terahertz (THz) frequencies in a GaAs/Al$_x$Ga$_{1-x}$As heterostructure with a two-dimensional (2D) electron gas (W. Michailow et al., Sci. Adv. \textbf{8}, eabi8398 (2022)). In contrast to the conventional PE phenomena, the IPPE effect is observed at normal incidence of radiation, the height…
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A new photoelectric phenomenon, the in-plane photoelectric (IPPE) effect, has been recently discovered at terahertz (THz) frequencies in a GaAs/Al$_x$Ga$_{1-x}$As heterostructure with a two-dimensional (2D) electron gas (W. Michailow et al., Sci. Adv. \textbf{8}, eabi8398 (2022)). In contrast to the conventional PE phenomena, the IPPE effect is observed at normal incidence of radiation, the height of the in-plane potential step, which electrons overcome after absorption of a THz photon, is electrically tunable by gate voltages, and the effect is maximal at a negative electron ``work function'', when the Fermi energy lies above the potential barrier. Based on the discovered phenomenon, efficient detection of THz radiation has been demonstrated. In this work we present a detailed theory of the IPPE effect providing analytical results for the THz wave generated photocurrent, the quantum efficiency, and the internal responsivity of the detector, in dependence on the frequency, the gate voltages, and the geometrical parameters of the detector. The calculations are performed for macroscopically wide samples at zero temperature. Results of the theory are applicable to any semiconductor systems with 2D electron gases, including III-V structures, silicon-based field effect transistors, and the novel 2D layered, graphene-related materials.
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Submitted 23 August, 2022; v1 submitted 29 October, 2021;
originally announced October 2021.
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An in-plane photoelectric effect in two-dimensional electron systems for terahertz detection
Authors:
Wladislaw Michailow,
Peter Spencer,
Nikita W. Almond,
Stephen J. Kindness,
Robert Wallis,
Thomas A. Mitchell,
Riccardo Degl'Innocenti,
Sergey A. Mikhailov,
Harvey E. Beere,
David A. Ritchie
Abstract:
The photoelectric effect consists in the photoexcitation of electrons above a potential barrier at a material interface and is exploited for photodetection over a wide frequency range. This three-dimensional process has an inherent inefficiency: photoexcited electrons gain momenta predominantly parallel to the interface, while to leave the material they have to move perpendicular to it. Here, we r…
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The photoelectric effect consists in the photoexcitation of electrons above a potential barrier at a material interface and is exploited for photodetection over a wide frequency range. This three-dimensional process has an inherent inefficiency: photoexcited electrons gain momenta predominantly parallel to the interface, while to leave the material they have to move perpendicular to it. Here, we report on the discovery of an in-plane photoelectric effect occurring within a two-dimensional electron gas. In this purely quantum-mechanical, scattering-free process, photo-electron momenta are perfectly aligned with the desired direction of motion. The "work function" is artificially created and tunable in-situ. The phenomenon is utilized to build a direct terahertz detector, which yields a giant zero-bias photoresponse that exceeds the predictions by known mechanisms by more than 10-fold. This new aspect of light-matter interaction in two-dimensional systems paves the way towards a new class of highly efficient photodetectors covering the entire terahertz range.
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Submitted 8 November, 2020;
originally announced November 2020.
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Triggering InAs/GaAs Quantum Dot nucleation and growth rate determination by in-situ modulation of surface energy
Authors:
Peter Spencer,
Chong Chen,
Wladislaw Michailow,
Harvey Beere,
David Ritchie
Abstract:
Epitaxial InAs/GaAs Quantum Dots (QDs) are widely used as highly efficient and pure sources of single photons and entangled photon-pairs, however reliable wafer-scale growth techniques have proved elusive. Growth of two-dimensional Quantum Well (QW) thin-films can be achieved with atomic precision down to below the de Broglie wavelength of electrons in the material, exposing the quantum particle-i…
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Epitaxial InAs/GaAs Quantum Dots (QDs) are widely used as highly efficient and pure sources of single photons and entangled photon-pairs, however reliable wafer-scale growth techniques have proved elusive. Growth of two-dimensional Quantum Well (QW) thin-films can be achieved with atomic precision down to below the de Broglie wavelength of electrons in the material, exposing the quantum particle-in-a-box energy vs. thickness-squared relationship. However, difficulties in controlling the exact moment of nanostructure nucleation obscure this behaviour in epitaxial QD material, preventing a clear understanding of their growth. In this work we demonstrate that QD nucleation can be induced by directly modulating the crystal surface energy without additional materials or equipment. This gains us quantitative measure of the QD growth rate and enables predictive design of QD growth processes. We believe this technique will be crucial to the realisation of uniform arrays of QDs required for scalable quantum devices at the single-photon level.
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Submitted 13 June, 2019;
originally announced June 2019.
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Combined electrical transport and capacitance spectroscopy of a ${\mathrm{MoS_2-LiNbO_3}}$ field effect transistor
Authors:
W. Michailow,
F. J. R. Schülein,
B. Möller,
E. Preciado,
A. E. Nguyen,
G. v. Son,
J. Mann,
A. L. Hörner,
A. Wixforth,
L. Bartels,
H. J. Krenner
Abstract:
We have measured both the current-voltage ($I_\mathrm{SD}$-$V_\mathrm{GS}$) and capacitance-voltage ($C$-$V_\mathrm{GS}$) characteristics of a $\mathrm{MoS_2-LiNbO_3}$ field effect transistor. From the measured capacitance we calculate the electron surface density and show that its gate voltage dependence follows the theoretical prediction resulting from the two-dimensional free electron model. Th…
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We have measured both the current-voltage ($I_\mathrm{SD}$-$V_\mathrm{GS}$) and capacitance-voltage ($C$-$V_\mathrm{GS}$) characteristics of a $\mathrm{MoS_2-LiNbO_3}$ field effect transistor. From the measured capacitance we calculate the electron surface density and show that its gate voltage dependence follows the theoretical prediction resulting from the two-dimensional free electron model. This model allows us to fit the measured $I_\mathrm{SD}$-$V_\mathrm{GS}$ characteristics over the \emph{entire range} of $V_\mathrm{GS}$. Combining this experimental result with the measured current-voltage characteristics, we determine the field effect mobility as a function of gate voltage. We show that for our device this improved combined approach yields significantly smaller values (more than a factor of 4) of the electron mobility than the conventional analysis of the current-voltage characteristics only.
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Submitted 2 January, 2017;
originally announced January 2017.
