Skip to main content

Showing 1–4 of 4 results for author: Klochan, J

.
  1. Quantum dot state initialization by control of tunneling rates

    Authors: Tobias Wenz, Jevgeny Klochan, Frank Hohls, Thomas Gerster, Vyacheslavs Kashcheyevs, Hans W. Schumacher

    Abstract: We study the loading of electrons into a quantum dot with dynamically controlled tunnel barriers. We introduce a method to measure tunneling rates for individual discrete states and to identify their relaxation paths. Exponential selectivity of the tunnel coupling enables loading into specific quantum dot states by tuning independently energy and rates. While for the single-electron case orbital r… ▽ More

    Submitted 6 March, 2019; originally announced March 2019.

    Journal ref: Phys. Rev. B 99, 201409 (2019)

  2. Gigahertz Single-Electron Pumping Mediated by Parasitic States

    Authors: A. Rossi, J. Klochan, J. Timoshenko, F. E. Hudson, M. Möttönen, S. Rogge, A. S. Dzurak, V. Kashcheyevs, G. C. Tettamanzi

    Abstract: In quantum metrology, semiconductor single-electron pumps are used to generate accurate electric currents with the ultimate goal of implementing the emerging quantum standard of the ampere. Pumps based on electrostatically defined tunable quantum dots (QDs) have thus far shown the most promising performance in combining fast and accurate charge transfer. However, at frequencies exceeding approxima… ▽ More

    Submitted 27 June, 2018; v1 submitted 2 March, 2018; originally announced March 2018.

    Comments: 15 pages, 8 figures (including Supporting Information)

    Journal ref: Nano Letters 18, 4141 (2018)

  3. arXiv:1612.09547  [pdf, other

    cond-mat.mes-hall

    Design and operation of CMOS-compatible electron pumps fabricated with optical lithography

    Authors: P. Clapera, J. Klochan, R. Lavieville, S. Barraud, L. Hutin, M. Sanquer, M. Vinet, A. Cinins, G. Barinovs, V. Kashcheyevs, X. Jehl

    Abstract: We report CMOS-compatible quantized current sources (electron pumps) fabricated with nanowires (NWs) on 300 mm SOI wafers. Unlike other Al, GaAs or Si based metallic or semiconductor pumps, the fabrication does not rely on electron-beam lithography. The structure consists of two gates in series on the nanowire and the only difference with the SOI nanowire process lies in long (40 nm) nitride space… ▽ More

    Submitted 30 December, 2016; originally announced December 2016.

    Journal ref: IEEE Electron Device Letters 38, 414 (2017)

  4. arXiv:1603.00250  [pdf, other

    cond-mat.mes-hall

    Dopant-controlled single-electron pumping through a metallic island

    Authors: Tobias Wenz, Frank Hohls, Xavier Jehl, Marc Sanquer, Sylvain Barraud, Jevgeny Klochan, Girts Barinovs, Vyacheslavs Kashcheyevs

    Abstract: We investigate a hybrid metallic island / single dopant electron pump based on fully-depleted silicon on insulator technology. Electron transfer between the central metallic island and the leads is controlled by resonant tunneling through single phosphorus dopants in the barriers. Top gates above the barriers are used control the resonance conditions. Applying radio frequency signals to the gates,… ▽ More

    Submitted 1 March, 2016; originally announced March 2016.

    Journal ref: Appl. Phys. Lett. 108, 213107 (2016)