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Kilobyte-Scale, Selector-Free, Temperature-Hard AlScN Ferroelectric Diode Crossbar Arrays
Authors:
Zirun Han,
Chao-Chuan Chen,
Dhiren K. Pradhan,
David C. Moore,
Ravali Gudavalli,
Xindi Yang,
Kwan-Ho Kim,
Hyunmin Cho,
Zachary Anderson,
Spencer Ware,
Harsh Yellai,
W. Joshua Kennedy,
Nicholas R. Glavin,
Roy H. Olsson III,
Deep Jariwala
Abstract:
We report the fabrication and characterization of kilobyte-scale, selector-free, ferroelectric (FE) diode crossbar memory arrays based on aluminum scandium nitride (AlScN). Utilizing a fully CMOS back-end-of-line (BEOL) compatible process, we fabricated 2-kilobyte (128 $\times$ 128) arrays with device diameters down to 5 $μ$m, achieving memory densities up to 2500 bits/mm$^2$. Large-scale electric…
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We report the fabrication and characterization of kilobyte-scale, selector-free, ferroelectric (FE) diode crossbar memory arrays based on aluminum scandium nitride (AlScN). Utilizing a fully CMOS back-end-of-line (BEOL) compatible process, we fabricated 2-kilobyte (128 $\times$ 128) arrays with device diameters down to 5 $μ$m, achieving memory densities up to 2500 bits/mm$^2$. Large-scale electrical characterization across 1000 randomly selected devices reveals a yield rate of 95.2%, a tight switching voltage distribution with a coefficient of variation (CV) of 0.003, and consistent on/off ratios of around 10 with a CV of 0.27. We demonstrate selector-free read and program operations of the array, enabled by the high nonlinearity, rectification, and uniform switching behavior of the FE diodes. Furthermore, we verified consistent ferroelectric switching during array operation at temperatures up to 600 $^\circ$C. Our results highlight the potential of AlScN FE diode arrays for energy-efficient, high-density memory applications and lay the groundwork for future integration in compute-near-memory, high-temperature memory, and analog compute-in-memory systems.
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Submitted 5 June, 2025;
originally announced June 2025.
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Al0.68Sc0.32N/SiC based metal-ferroelectric-semiconductor capacitors operating up to 1000 °C
Authors:
Yunfei He,
David C. Moore,
Yubo Wang,
Spencer Ware,
Sizhe Ma,
Dhiren K. Pradhan,
Zekun Hu,
Xingyu Du,
W. Joshua Kennedy,
Nicholas R. Glavin,
Roy H. Olsson III,
Deep Jariwala
Abstract:
Ferroelectric (Fe) materials-based devices show great promise for non-volatile memory applications, yet few demonstrate reliable operation at elevated temperatures. In this work, we demonstrate Ni/Al0.68Sc0.32N/4H-SiC metal-ferroelectric-semiconductor capacitors for high-temperature non-volatile memory applications. Our 30-nm thick ferroelectric Al0.68Sc0.32N film grown on SiC exhibits stable and…
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Ferroelectric (Fe) materials-based devices show great promise for non-volatile memory applications, yet few demonstrate reliable operation at elevated temperatures. In this work, we demonstrate Ni/Al0.68Sc0.32N/4H-SiC metal-ferroelectric-semiconductor capacitors for high-temperature non-volatile memory applications. Our 30-nm thick ferroelectric Al0.68Sc0.32N film grown on SiC exhibits stable and robust ferroelectric switching up to 1000°C. The coercive field decreases linearly from -6.4/+11.9 MV cm-1 at room temperature to -3.1/+7.8 MV cm-1 at 800°C, further reducing to -2.5 MV cm-1 at 1000°C. At 600°C, the devices achieve remarkable reliability with ~2000 endurance cycles and over at least 100 hours of retention with negligible polarization loss. At 800°C, the devices retain data for at least 10,000 seconds and exceed 400 write cycles. Our results further highlight the potential for ferroelectric AlScN thin-films particularly when paired with SiC semiconductor substrates for high-temperature non-volatile memory.
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Submitted 19 March, 2025; v1 submitted 25 November, 2024;
originally announced November 2024.
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Materials for High Temperature Digital Electronics
Authors:
Dhiren K. Pradhan,
David C. Moore,
A. Matt Francis,
Jacob Kupernik,
W. Joshua Kennedy,
Nicholas R. Glavin,
Roy H. Olsson III,
Deep Jariwala
Abstract:
Silicon microelectronics, consisting of complementary metal oxide semiconductor (CMOS) technology, have changed nearly all aspects of human life from communication to transportation, entertainment, and healthcare. Despite the widespread and mainstream use, current silicon-based devices suffer significant reliability issues at temperatures exceeding 125 C. The emergent technological frontiers of sp…
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Silicon microelectronics, consisting of complementary metal oxide semiconductor (CMOS) technology, have changed nearly all aspects of human life from communication to transportation, entertainment, and healthcare. Despite the widespread and mainstream use, current silicon-based devices suffer significant reliability issues at temperatures exceeding 125 C. The emergent technological frontiers of space exploration, geothermal energy harvesting, nuclear energy, unmanned avionic systems, and autonomous driving will rely on control systems, sensors, and communication devices which operate at temperatures as high as 500 C and beyond. At these extreme temperatures, active (heat exchanger, phase change cooling) or passive (fins and thermal interface materials) cooling strategies add significant mass and complication which is often infeasible. Thus, new material solutions beyond conventional silicon CMOS devices are necessary for high temperature, resilient electronic systems. Accomplishing this will require a united effort to explore development, integration, and ultimately manufacturing of non-silicon-based logic and memory technologies, non-traditional metals for interconnects, and ceramic packaging technology.
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Submitted 21 August, 2024; v1 submitted 4 April, 2024;
originally announced April 2024.
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Accurate Crystal Structure Prediction of New 2D Hybrid Organic Inorganic Perovskites
Authors:
Nima Karimitari,
William J. Baldwin,
Evan W. Muller,
Zachary J. L. Bare,
W. Joshua Kennedy,
Gábor Csányi,
Christopher Sutton
Abstract:
Low dimensional hybrid organic-inorganic perovskites (HOIPs) represent a promising class of electronically active materials for both light absorption and emission. The design space of HOIPs is extremely large, since a diverse space of organic cations can be combined with different inorganic frameworks. This immense design space allows for tunable electronic and mechanical properties, but also nece…
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Low dimensional hybrid organic-inorganic perovskites (HOIPs) represent a promising class of electronically active materials for both light absorption and emission. The design space of HOIPs is extremely large, since a diverse space of organic cations can be combined with different inorganic frameworks. This immense design space allows for tunable electronic and mechanical properties, but also necessitates the development of new tools for in silico high throughput analysis of candidate structures. In this work, we present an accurate, efficient, transferable and widely applicable machine learning interatomic potential (MLIP) for predicting the structure of new 2D HOIPs. Using the MACE architecture, an MLIP is trained on 86 diverse experimentally reported HOIP structures. The model is tested on 73 unseen perovskite compositions, and achieves chemical accuracy with respect to the reference electronic structure method. Our model is then combined with a simple random structure search algorithm to predict the structure of hypothetical HOIPs given only the proposed composition. Success is demonstrated by correctly and reliably recovering the crystal structure of a set of experimentally known 2D perovskites. Such a random structure search is impossible with ab initio methods due to the associated computational cost, but is relatively inexpensive with the MACE potential. Finally, the procedure is used to predict the structure formed by a new organic cation with no previously known corresponding perovskite. Laboratory synthesis of the new hybrid perovskite confirms the accuracy of our prediction. This capability, applied at scale, enables efficient screening of thousands of combinations of organic cations and inorganic layers.
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Submitted 11 March, 2024;
originally announced March 2024.
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Scalable and Stable Ferroelectric Non-Volatile Memory at > 500 $^\circ$C
Authors:
Dhiren K. Pradhan,
David C. Moore,
Gwangwoo Kim,
Yunfei He,
Pariasadat Musavigharavi,
Kwan-Ho Kim,
Nishant Sharma,
Zirun Han,
Xingyu Du,
Venkata S. Puli,
Eric A. Stach,
W. Joshua Kennedy,
Nicholas R. Glavin,
Roy H. Olsson III,
Deep Jariwala
Abstract:
Non-volatile memory (NVM) devices that reliably operate at temperatures above 300 $^\circ$C are currently non-existent and remains a critically unmet challenge in the development of high-temperature (T) resilient electronics, necessary for many emerging, complex computing and sensing in harsh environments. Ferroelectric Al$_x$Sc$_{1-x}$N exhibits strong potential for utilization in NVM devices ope…
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Non-volatile memory (NVM) devices that reliably operate at temperatures above 300 $^\circ$C are currently non-existent and remains a critically unmet challenge in the development of high-temperature (T) resilient electronics, necessary for many emerging, complex computing and sensing in harsh environments. Ferroelectric Al$_x$Sc$_{1-x}$N exhibits strong potential for utilization in NVM devices operating at very high temperatures (> 500 $^\circ$C) given its stable and high remnant polarization (PR) above 100 $μ$C/cm$^2$ with demonstrated ferroelectric transition temperature (TC) > 1000 $^\circ$C. Here, we demonstrate an Al$_{0.68}$Sc$_{0.32}$N ferroelectric diode based NVM device that can reliably operate with clear ferroelectric switching up to 600 $^\circ$C with distinguishable On and Off states. The coercive field (EC) from the Pulsed I-V measurements is found to be -5.84 (EC-) and +5.98 (EC+) (+/- 0.1) MV/cm at room temperature (RT) and found to decrease with increasing temperature up to 600 $^\circ$C. The devices exhibit high remnant polarizations (> 100 $μ$C/cm$^2$) which are stable at high temperatures. At 500 $^\circ$C, our devices show 1 million read cycles and stable On-Off ratio above 1 for > 6 hours. Finally, the operating voltages of our AlScN ferrodiodes are < 15 V at 600 $^\circ$C which is well matched and compatible with Silicon Carbide (SiC) based high temperature logic technology, thereby making our demonstration a major step towards commercialization of NVM integrated high-T computers.
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Submitted 8 September, 2023;
originally announced September 2023.
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Scalable synthesis of 2D van der Waals superlattices
Authors:
Michael J. Motala,
Xiang Zhang,
Pawan Kumar,
Eliezer F. Oliveira,
Anna Benton,
Paige Miesle,
Rahul Rao,
Peter R. Stevenson,
David Moore,
Adam Alfieri,
Jason Lynch,
Guanhui Gao,
Sijie Ma,
Hanyu Zhu,
Zhe Wang,
Ivan Petrov,
Eric A. Stach,
W. Joshua Kennedy,
Shiva Vengala,
James M. Tour,
Douglas S. Galvao,
Deep Jariwala,
Christopher Muratore,
Michael Snure,
Pulickel M. Ajayan
, et al. (1 additional authors not shown)
Abstract:
Heterostructure materials form the basis of much of modern electronics, from transistors to lasers and light-emitting diodes. Recent years have seen a renewed focus on creating heterostructures through the vertical integration of two-dimensional materials, including graphene, hexagonal boron nitride, and transition metal dichalcogenides (TMDCs). However, fundamental challenges associated with mate…
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Heterostructure materials form the basis of much of modern electronics, from transistors to lasers and light-emitting diodes. Recent years have seen a renewed focus on creating heterostructures through the vertical integration of two-dimensional materials, including graphene, hexagonal boron nitride, and transition metal dichalcogenides (TMDCs). However, fundamental challenges associated with materials processing have limited material quality and impeded scalability. We demonstrate a method to convert sub-nanometer metal films deposited on silicon and sapphire into TMDC heterostructures through vapor-phase processing. The resulting heterostructures and superlattices exhibit novel properties compared with stand-alone TMDCs, including reduced bandgap, enhanced light-matter coupling, and improved catalytic performance. This robust and scalable synthetic method provides new opportunities to generate a wide range of artificially stacked 2D superlattices with controlled morphology and composition.
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Submitted 4 November, 2021;
originally announced November 2021.