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Optimizing Metal-Organic Chemical Vapor Deposition for Ultrawide Band-Gap MgSiN2 Thin Films
Authors:
Chenxi Hu,
Abdul Mukit,
Vijay Gopal Thirupakuzi Vangipuram,
Christopher Chae,
Jinwoo Hwang,
Kathleen Kash,
Hongping Zhao
Abstract:
Orthorhombic II-IV nitride semiconductors offer an expanded and more tunable material set with unique properties, while maintaining close compatibility with the wurtzite crystal structure of the III-nitrides. In particular, MgSiN2, a II-IV nitride closely lattice matched to GaN and AlN has a band gap suitable for photonic applications in the UV-C wavelength region. MgSiN2 is also a promising candi…
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Orthorhombic II-IV nitride semiconductors offer an expanded and more tunable material set with unique properties, while maintaining close compatibility with the wurtzite crystal structure of the III-nitrides. In particular, MgSiN2, a II-IV nitride closely lattice matched to GaN and AlN has a band gap suitable for photonic applications in the UV-C wavelength region. MgSiN2 is also a promising candidate to exhibit ferroelectricity, which has only been observed in very few nitride materials. This study builds on our previous work on the metal-organic chemical vapor deposition (MOCVD) of MgSiN2 thin films grown on GaN-on-sapphire and c-plane sapphire substrates by exploring higher growth temperature windows, resulting in higher crystalline quality and improved interfaces. Correlations between the growth conditions (Mg:Si precursor molar flow rate ratio, reactor pressure, and growth temperatures from 900C to 960C) and the resultant film quality are investigated for films grown on GaN-on-sapphire. High-resolution transmission electron microscopy (HR-TEM) reveals high-quality orthorhombic single-crystal MgSiN2, confirming successful epitaxial growth on GaN. Optical transmittance measurements indicate the direct band gap is 6.34-6.36 eV and indirect band gap is 5.77-5.81 eV, affirming the realization of an ultrawide-band gap II-IV nitride semiconductor that is structurally compatible with existing III-nitride device platforms.
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Submitted 1 April, 2025;
originally announced April 2025.
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Metal-organic chemical vapor deposition of MgGeN2 films on GaN and sapphire
Authors:
Chenxi Hu,
Vijay Gopal Thirupakuzi Vangipuram,
Christopher Chae,
Ilteris K. Turan,
Nichole Hoven,
Walter R. L. Lambrecht,
Jinwoo Hwang,
Yumi Ijiri,
Hongping Zhao,
Kathleen Kash
Abstract:
MgGeN2 films were synthesized using metal-organic chemical vapor deposition on GaN/c-sapphire templates and c-plane sapphire substrates. Energy-dispersive X-ray spectroscopy was used to estimate the cation composition ratios. To mitigate magnesium evaporation, the films were grown at pyrometer temperature 745 °C with a wafer rotation speed of 1000 rpm. Growth rates were determined by fitting energ…
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MgGeN2 films were synthesized using metal-organic chemical vapor deposition on GaN/c-sapphire templates and c-plane sapphire substrates. Energy-dispersive X-ray spectroscopy was used to estimate the cation composition ratios. To mitigate magnesium evaporation, the films were grown at pyrometer temperature 745 °C with a wafer rotation speed of 1000 rpm. Growth rates were determined by fitting energy-dispersive X-ray spectroscopy spectra to film thicknesses using NIST DTSA-II software. The thickness estimates determined by this method were consistent with scanning transmission electron microscopy measurements done for selected samples. Scanning electron microscopy images revealed faceted surfaces indicative of a tendency toward three-dimensional growth. X-ray diffraction spectra confirmed that the films were highly crystalline and exhibited preferential orientation in alignment with the substrate. Atomic force microscopy measurements show that film thicknesses are consistent across samples grown on both GaN templates and sapphire substrates, with typical roughnesses around 10 nm. Transmittance spectra of films grown on double-side-polished sapphire substrates yielded band gaps of 4.28 +- 0.06 eV for samples exhibiting close-to-ideal stoichiometry. Comparison of the measured spectra with ab initio calculations are in good agreement both near the band gap and at higher energies where excitation is into higher-lying bands. These findings provide insight into the growth and characterization of MgGeN2, contributing to the development of this material for potential applications in optoelectronics and power electronics.
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Submitted 25 February, 2025;
originally announced February 2025.
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Metal-organic chemical vapor deposition of MgSiN$_{2}$ thin films
Authors:
Vijay Gopal Thirupakuzi Vangipuram,
Chenxi Hu,
Abdul Mukit Majumder,
Christopher Chae,
Kaitian Zhang,
Jinwoo Hwang,
Kathleen Kash,
Hongping Zhao
Abstract:
Orthorhombic-structured II-IV nitrides provide a promising opportunity to expand the material platform while maintaining compatibility with the wurtzite crystal structure of the traditional III-nitride material system. Among them, MgSiN$_{2}$ stands out due to its close compatibility with GaN and AlN and its theoretically predicted ultrawide direct band gap of 6.28 eV. In this work, the growth of…
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Orthorhombic-structured II-IV nitrides provide a promising opportunity to expand the material platform while maintaining compatibility with the wurtzite crystal structure of the traditional III-nitride material system. Among them, MgSiN$_{2}$ stands out due to its close compatibility with GaN and AlN and its theoretically predicted ultrawide direct band gap of 6.28 eV. In this work, the growth of MgSiN$_{2}$ thin films on GaN-on-sapphire and c-plane sapphire substrates was investigated using metal-organic chemical vapor deposition (MOCVD). MOCVD growth conditions were correlated with film quality and crystallinity for samples grown on GaN-on-sapphire substrates. The effects of Mg:Si precursor molar flow rate ratios and growth pressure at two different temperatures, 745$^{\circ}$C and 850$^{\circ}$C, were studied comprehensively. High-resolution scanning transmission electron microscopy (STEM) imaging confirmed the formation of high-quality, single-crystal MgSiN$_{2}$ films. Optical band gap extraction from transmittance measurements yielded direct band gap values ranging from 6.13 eV to 6.27 eV for samples grown under various conditions, confirming the realization of an ultrawide-band gap, III-nitride-compatible, II-IV-nitride material.
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Submitted 24 February, 2025;
originally announced February 2025.
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Experimental determination of the valence band offsets of $ZnGeN_2$ and $ZnGe_{0.94}Ga_{0.12}N_2$ with $GaN$
Authors:
Md Rezaul Karim,
Brenton A. Noesges,
Benthara Hewage Dinushi Jayatunga,
Menglin Zhu,
Jinwoo Hwang,
Walter R. L. Lambrecht,
Leonard J. Brillson,
Kathleen Kash,
Hongping Zhao
Abstract:
A predicted type-II staggered band alignment with an approximately $1.4 eV$ valence band offset at the $ZnGeN_2/GaN$ heterointerface has inspired novel band-engineered $III-N/ZnGeN_2$ heterostructure-based device designs for applications in high performance optoelectronics. We report on the determination of the valence band offset between metalorganic chemical vapor deposition grown…
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A predicted type-II staggered band alignment with an approximately $1.4 eV$ valence band offset at the $ZnGeN_2/GaN$ heterointerface has inspired novel band-engineered $III-N/ZnGeN_2$ heterostructure-based device designs for applications in high performance optoelectronics. We report on the determination of the valence band offset between metalorganic chemical vapor deposition grown $(ZnGe)_{1-x}Ga_{2x}N_2$, for $x = 0$ and $0.06$, and $GaN$ using X-ray photoemission spectroscopy. The valence band of $ZnGeN_2$ was found to lie $1.45-1.65 eV$ above that of $GaN$. This result agrees well with the value predicted by first-principles density functional theory calculations using the local density approximation for the potential profile and quasiparticle self-consistent GW calculations of the band edge states relative to the potential. For $(ZnGe)_{0.94}Ga_{0.12}N_2$ the value was determined to be $1.29 eV$, $~10-20\%$ lower than that of $ZnGeN_2$. The experimental determination of the large band offset between $ZnGeN_2$ and $GaN$ provides promising alternative solutions to address challenges faced with pure III-nitride-based structures and devices.
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Submitted 3 February, 2021;
originally announced February 2021.
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Characterization and control of ZnGeN2 cation lattice ordering
Authors:
Eric W. Blanton,
Keliang He,
Jie Shan,
Kathleen Kash
Abstract:
ZnGeN2 and other heterovalent ternary semiconductors have important potential applications in optoelectronics, but ordering of the cation sublattice, which can affect the band gap, lattice parameters, and phonons, is not yet well understood. Here the effects of growth and processing conditions on the ordering of the ZnGeN2 cation sublattice were investigated using x-ray diffraction and Raman spect…
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ZnGeN2 and other heterovalent ternary semiconductors have important potential applications in optoelectronics, but ordering of the cation sublattice, which can affect the band gap, lattice parameters, and phonons, is not yet well understood. Here the effects of growth and processing conditions on the ordering of the ZnGeN2 cation sublattice were investigated using x-ray diffraction and Raman spectroscopy. Polycrystalline ZnGeN2 was grown by exposing solid Ge to Zn and NH3 vapors at temperatures between 758 degree C and 914 degree C. Crystallites tended to be rod-shaped, with growth rates higher along the c-axis. The degree of ordering, from disordered, wurtzite-like x-ray diffraction spectra to orthorhombic, with space group Pna21, increased with increasing growth temperature, as evidenced by the appearance of superstructure peaks and peak splittings in the diffraction patterns. Annealing disordered, low-temperature-grown ZnGeN2 at 850 degree C resulted in increased cation ordering. Growth of ZnGeN2 on a liquid Sn-Ge-Zn alloy at 758 degree C showed an increase in the tendency for cation ordering at a lower growth temperature, and resulted in hexagonal platelet-shaped crystals. The trends shown here may help to guide understanding of the synthesis and characterization of other heterovalent ternary nitride semiconductors as well as ZnGeN2.
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Submitted 11 January, 2017; v1 submitted 11 October, 2016;
originally announced October 2016.
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Raman study of the vibrational modes in ZnGeN2 (0001)
Authors:
Eric W. Blanton,
Mark Hagemann,
Keliang He,
Jie Shan,
Walter R. L. Lambrecht,
Kathleen Kash
Abstract:
A Raman spectroscopy study was carried out for ZnGeN2 with direction of propagation along the (0001) crystallographic direction on hexagonal single crystal platelets obtained by reaction of gaseous ammonia with a Zn-Ge-Sn liquid alloy at 758 degree C. The sample geometry allowed measurement of the a2 and a1 Raman modes. First-principles calculations were carried out of the spectra. Measurements wi…
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A Raman spectroscopy study was carried out for ZnGeN2 with direction of propagation along the (0001) crystallographic direction on hexagonal single crystal platelets obtained by reaction of gaseous ammonia with a Zn-Ge-Sn liquid alloy at 758 degree C. The sample geometry allowed measurement of the a2 and a1 Raman modes. First-principles calculations were carried out of the spectra. Measurements with crossed polarizers yielded spectra that agreed well with first-principles calculations of the a2 modes. Measurements with parallel polarizers should in principle provide the a1L modes. However, for most of the Raman modes, the LO-TO splitting was calculated to be very small, and for the few modes which were predicted to have larger LO-TO splittings, the LO mode was not observed. This absence is tentatively explained in terms of overdamped LO-plasmon coupling. LO-TO mode crossing was identified by comparing the calculated eigenvectors and intensities of individual modes. Some features in the experimental spectra were identified as arising from critical points in the phonon density of states and are indicative of the degree of disorder on the cation lattice.
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Submitted 29 September, 2016;
originally announced September 2016.
