Optical bound states in the continuum in subwavelength gratings made of an epitaxial van der Waals material
Authors:
Emilia Pruszyńska-Karbownik,
Tomasz Fąs,
Katarzyna Brańko,
Dmitriy Yavorskiy,
Bartłomiej Stonio,
Rafał Bożek,
Piotr Karbownik,
Jerzy Wróbel,
Tomasz Czyszanowski,
Tomasz Stefaniuk,
Wojciech Pacuski,
Jan Suffczyński
Abstract:
High refractive index (4.4 at 1100 nm), negligibly small absorption in near-infrared spectral range, and ease of processing make MoSe$_2$ a perfect material for applications in near-infrared photonics. So far, implementation of MoSe$_2$-based photonic structures has been hindered by the lack of large surface MoSe$_2$ substrates. The use of molecular beam epitaxy allows the production of homogeneou…
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High refractive index (4.4 at 1100 nm), negligibly small absorption in near-infrared spectral range, and ease of processing make MoSe$_2$ a perfect material for applications in near-infrared photonics. So far, implementation of MoSe$_2$-based photonic structures has been hindered by the lack of large surface MoSe$_2$ substrates. The use of molecular beam epitaxy allows the production of homogeneous layers of MoSe$_2$ with a few-inch surface and a thickness controlled at the sub-nm level. In the present work, we design by theoretical calculations and fabricate by a simple lithography process an ultrathin subwavelength grating out of 42-nm thick, epitaxially-grown MoSe$_2$ layer. Our polarization-resolved reflectivity measurements confirm that the gratings host a peculiar type of a confined optical mode that is a bound state in the continuum. Moreover, the fabricated structures enhance the efficiency of the third harmonic generation by over three orders of magnitude as compared to the unstructured MoSe$_2$ layer. The presented results are promising for the realization of flat, ultra-compact devices for lasing, wavefront control, and higher-order topological states of the light.
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Submitted 5 February, 2025;
originally announced February 2025.
