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Peak splitting and bias fields in ferroelectric hafnia mediated by interface charge effects
Authors:
Moritz Engl,
Wassim Hamouda,
Ines Häusler,
Suzanne Lancaster,
Luca Carpentieri,
Thomas Mikolajick,
Catherine Dubourdieu,
Stefan Slesazeck
Abstract:
The pristine state of hafnium based ferroelectric devices exhibits various unwanted properties, such as imprint and peak splitting, which diminish with bipolar cycling. The incorporation of a niobium oxide layer at different positions in metal-ferroelectric-metal and metal-ferroelectric-insulator-metal stacks is used to modify the pristine state of the device. X-ray photoelectron spectroscopy and…
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The pristine state of hafnium based ferroelectric devices exhibits various unwanted properties, such as imprint and peak splitting, which diminish with bipolar cycling. The incorporation of a niobium oxide layer at different positions in metal-ferroelectric-metal and metal-ferroelectric-insulator-metal stacks is used to modify the pristine state of the device. X-ray photoelectron spectroscopy and transmission electron microscopy measurements are used to investigate the influence of niobium oxide on the zirconium hafnium oxide layer. It is hypothesized that the charged vacancies generated by the introduced niobium oxide in the adjacent zirconium hafnium oxide layer result in an electric bias field that influences the pristine polarization state of the domains. A comparison of different stacks shows that peak splitting in the pristine state is most likely related to the formation of opposing electric bias fields in upwards and downwards polarized domains. Furthermore, the incorporation of niobium oxide in the zirconium hafnium oxide/aluminum oxide capacitor stack in between the ferroelectric and insulating layer leads to a peak splitting free device without imprint, which could be explained by the increased influence of charge trapping near the zirconium hafnium oxide-/niobium oxide and niobium oxide-/aluminum oxide interfaces.
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Submitted 14 March, 2025;
originally announced March 2025.
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Imaging Localized Variable Capacitance During Switching Processes in Silicon Diodes by Time-Resolved Electron Holography
Authors:
Tolga Wagner,
Hüseyin Çelik,
Dirk Berger,
Ines Häusler,
Michael Lehmann
Abstract:
Interference Gating or iGate is a unique method for ultrafast time-resolved electron holography in a transmission electron microscope enabling a spatiotemporal resolution in the nm and ns regime with a minimal technological effort. Here, iGate is used for the first image-based investigation of the local dynamics of the projected electric potential in the area of the space charge region of two diff…
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Interference Gating or iGate is a unique method for ultrafast time-resolved electron holography in a transmission electron microscope enabling a spatiotemporal resolution in the nm and ns regime with a minimal technological effort. Here, iGate is used for the first image-based investigation of the local dynamics of the projected electric potential in the area of the space charge region of two different general purpose silicon diodes during switching between unbiased and reverse biased condition with a temporal resolution of 25ns at a repetition rate of 3MHz. The obtained results for a focus-ion-beam-prepared ultrafast UG1A rectifier diode, which shows a decreasing capacitance with increasing reverse bias are in good agreement with an electric characterization of the macroscopic device as well as with theoretical expectations. For a severely modified 1N4007 device, however, time-resolved electron holography revealed a MOSCAP-like behavior with a rising capacitance in the area of the space charge region during the switching into reverse biased condition. Remarkably, a different behavior, dominated by the effective capacitance of the electrical setup, can be observed in the vacuum region outside both devices within the same measurements, clearly showing the benefits of localized dynamic potentiometry.
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Submitted 15 May, 2024; v1 submitted 14 May, 2024;
originally announced May 2024.
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Charge-Trapping-Induced Compensation of the Ferroelectric Polarization in FTJs: Optimal Conditions for a Synaptic Device Operation
Authors:
R. Fontanini,
M. Segatto,
K. S. Nair,
M. Holzer,
F. Driussi,
I. Häusler,
C. T. Koch,
C. Dubourdieu,
V. Deshpande,
D. Esseni
Abstract:
In this work, we present a clear evidence, based on numerical simulations and experiments, that the polarization compensation due to trapped charge strongly influences the ON/ OFF ratio in Hf 0.5 Zr 0.5 O 2 (HZO)-based ferroelectric tunnel junctions (FTJs). Furthermore, we identify and explain compensation conditions that enable an optimal operation of FTJs. Our results provide both key physical i…
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In this work, we present a clear evidence, based on numerical simulations and experiments, that the polarization compensation due to trapped charge strongly influences the ON/ OFF ratio in Hf 0.5 Zr 0.5 O 2 (HZO)-based ferroelectric tunnel junctions (FTJs). Furthermore, we identify and explain compensation conditions that enable an optimal operation of FTJs. Our results provide both key physical insights and design guidelines for the operation of FTJs as multilevel synaptic devices.
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Submitted 4 September, 2023;
originally announced September 2023.
