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Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry
Authors:
Michael Tanksalvala,
Christina L. Porter,
Yuka Esashi,
Bin Wang,
Nicholas W. Jenkins,
Zhe Zhang,
Galen P. Miley,
Joshua L. Knobloch,
Brendan McBennett,
Naoto Horiguchi,
Sadegh Yazdi,
Jihan Zhou,
Matthew N. Jacobs,
Charles S. Bevis,
Robert M. Karl Jr.,
Peter Johnsen,
David Ren,
Laura Waller,
Daniel E. Adams,
Seth L. Cousin,
Chen-Ting Liao,
Jianwei Miao,
Michael Gerrity,
Henry C. Kapteyn,
Margaret M. Murnane
Abstract:
Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic source…
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Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical- and phase-sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms. This tabletop microscope can non-destructively probe surface topography, layer thicknesses, and interface quality, as well as dopant concentrations and profiles. High-fidelity imaging was achieved by implementing variable-angle ptychographic imaging, by using total variation regularization to mitigate noise and artifacts in the reconstructed image, and by using a high-brightness, high-harmonic source with excellent intensity and wavefront stability. We validate our measurements through multiscale, multimodal imaging to show that this technique has unique advantages compared with other techniques based on electron and scanning-probe microscopies.
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Submitted 28 March, 2024;
originally announced April 2024.
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High-fidelity ptychographic imaging of highly periodic structures enabled by vortex high harmonic beams
Authors:
Bin Wang,
Nathan J. Brooks,
Peter C. Johnsen,
Nicholas W. Jenkins,
Yuka Esashi,
Iona Binnie,
Michael Tanksalvala,
Henry C. Kapteyn,
Margaret M. Murnane
Abstract:
Ptychographic Coherent Diffractive Imaging enables diffraction-limited imaging of nanoscale structures at extreme ultraviolet and x-ray wavelengths, where high-quality image-forming optics are not available. However, its reliance on a set of diverse diffraction patterns makes it challenging to use ptychography to image highly periodic samples, limiting its application to defect inspection for elec…
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Ptychographic Coherent Diffractive Imaging enables diffraction-limited imaging of nanoscale structures at extreme ultraviolet and x-ray wavelengths, where high-quality image-forming optics are not available. However, its reliance on a set of diverse diffraction patterns makes it challenging to use ptychography to image highly periodic samples, limiting its application to defect inspection for electronic and photonic devices. Here, we use a vortex high harmonic light beam driven by a laser carrying orbital angular momentum to implement extreme ultraviolet ptychographic imaging of highly periodic samples with high fidelity and reliability. We also demonstrate, for the first time to our knowledge, ptychographic imaging of an isolated, near-diffraction-limited defect in an otherwise periodic sample using vortex high harmonic beams. This enhanced metrology technique can enable high-fidelity imaging and inspection of highly periodic structures for next-generation nano, energy, photonic and quantum devices.
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Submitted 13 January, 2023;
originally announced January 2023.
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Universal behavior of highly-confined heat flow in semiconductor nanosystems: from nanomeshes to metalattices
Authors:
Brendan McBennett,
Albert Beardo,
Emma E. Nelson,
Begoña Abad,
Travis D. Frazer,
Amitava Adak,
Yuka Esashi,
Baowen Li,
Henry C. Kapteyn,
Margaret M. Murnane,
Joshua L. Knobloch
Abstract:
Nanostructuring on length scales corresponding to phonon mean free paths provides control over heat flow in semiconductors and makes it possible to engineer their thermal properties. However, the influence of boundaries limits the validity of bulk models, while first principles calculations are too computationally expensive to model real devices. Here we use extreme ultraviolet beams to study phon…
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Nanostructuring on length scales corresponding to phonon mean free paths provides control over heat flow in semiconductors and makes it possible to engineer their thermal properties. However, the influence of boundaries limits the validity of bulk models, while first principles calculations are too computationally expensive to model real devices. Here we use extreme ultraviolet beams to study phonon transport dynamics in a 3D nanostructured silicon metalattice with deep nanoscale feature size, and observe dramatically reduced thermal conductivity relative to bulk. To explain this behavior, we develop a predictive theory wherein thermal conduction separates into a geometric permeability component and an intrinsic viscous contribution, arising from a new and universal effect of nanoscale confinement on phonon flow. Using experiments and atomistic simulations, we show that our theory applies to a general set of highly-confined silicon nanosystems, from metalattices, nanomeshes, porous nanowires to nanowire networks, of great interest for next-generation energy-efficient devices.
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Submitted 28 March, 2024; v1 submitted 23 September, 2022;
originally announced September 2022.
