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Quantitative Profilometric Measurement of Magnetostriction in Thin-Films
Authors:
Hamish Greenall,
Benjamin J. Carey,
Douglas Bulla,
James S. Bennett,
Glen I. Harris,
Fernando Gotardo,
Scott Foster,
Warwick P. Bowen
Abstract:
A DC non-contact method for measuring the magnetostrictive strain in thin-films is demonstrated, achieving a state-of-the-art sensitivity of 0.1 ppm. In this method, an optical profilometer is used to measure the curvature induced in a magnetostrictively coated coverslip under a DC field through phase-sensitive interferometry. From this the magnetostrictive stress and strain are calculated using S…
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A DC non-contact method for measuring the magnetostrictive strain in thin-films is demonstrated, achieving a state-of-the-art sensitivity of 0.1 ppm. In this method, an optical profilometer is used to measure the curvature induced in a magnetostrictively coated coverslip under a DC field through phase-sensitive interferometry. From this the magnetostrictive stress and strain are calculated using Stoney's formula. This addresses limitations of conventional techniques that measure magnetostriction based on the deflection of a cantilever under an AC field, which require complex dedicated set-ups and are sensitive to vibrational noise. Further, it reveals information about the anisotropy of the film and allows for the possibility of measuring multiple samples simultaneously. The theoretical sensitivity limits are derived, predicting a shot-noise-limit of 0.01 ppm. The method is implemented to measure the magnetostrictive hysteresis and piezomagnetic coupling of thin-film galfenol. Degradation in film performance is observed above a thickness of 206 nm, alongside a change in coercivity. This prompts investigation into the growth and optimization of galfenol films for use in devices.
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Submitted 21 November, 2023;
originally announced November 2023.
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Waveguide-integrated and portable optomechanical magnetometer
Authors:
Fernando Gotardo,
Benjamin J. Carey,
Hamish Greenall,
Glen I. Harris,
Erick Romero,
Douglas Bulla,
Elizabeth M. Bridge,
James S. Bennett,
Scott Foster,
Warwick P. Bowen
Abstract:
Optomechanical magnetometers enable highly sensitive magnetic field sensing. However, all such magnetometers to date have been optically excited and read-out either via free space or a tapered optical fiber. This limits their scalability and integrability, and ultimately their range of applications. Here, we present an optomechanical magnetometer that is excited and read out via a suspended optica…
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Optomechanical magnetometers enable highly sensitive magnetic field sensing. However, all such magnetometers to date have been optically excited and read-out either via free space or a tapered optical fiber. This limits their scalability and integrability, and ultimately their range of applications. Here, we present an optomechanical magnetometer that is excited and read out via a suspended optical waveguide fabricated on the same silicon chip as the magnetometer. Moreover, we demonstrate that thermomechanical noise limited sensitivity is possible using portable electronics and laser. The magnetometer employs a silica microdisk resonator selectively sputtered with a magnetostrictive film of galfenol (FeGa) which induces a resonant frequency shift in response to an external magnetic field. Experimental results reveal the retention of high quality-factor optical whispering gallery mode resonances whilst also demonstrating high sensitivity and dynamic range in ambient conditions. The use of off-the-shelf portable electronics without compromising sensor performance demonstrates promise for applications.
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Submitted 27 July, 2023;
originally announced July 2023.
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On-chip scalable optomechanical magnetometers
Authors:
Bei-Bei Li,
Douglas Bulla,
Varun Prakash,
Stefan Forstner,
Ali Dehghan-Manshadi,
Halina Rubinsztein-Dunlop,
Scott Foster,
Warwick P. Bowen
Abstract:
The dual-resonant enhancement of mechanical and optical response in cavity optomechanical magnetometers enables precision sensing of magnetic fields. In previous working prototypes of such magnetometers, a cavity optomechanical system is functionalized by manually epoxy-bonding a grain of magnetostrictive material. While this approach allows proof-of-principle demonstrations, practical application…
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The dual-resonant enhancement of mechanical and optical response in cavity optomechanical magnetometers enables precision sensing of magnetic fields. In previous working prototypes of such magnetometers, a cavity optomechanical system is functionalized by manually epoxy-bonding a grain of magnetostrictive material. While this approach allows proof-of-principle demonstrations, practical applications require more scalable and reproducible fabrication pathways. In this work, we scalably fabricate optomechanical magnetometers on a silicon chip, with reproducible performance across different devices, by sputter coating a magnetostrictive film onto high quality toroidal microresonators. Furthermore, we demonstrate that thermally annealing the sputtered film can improve the magnetometer sensitivity by a factor of 6.3. A peak sensitivity of 585 pT/Hz^1/2 is achieved, which is comparable with previously reported results using epoxy-bonding.
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Submitted 25 May, 2018; v1 submitted 24 May, 2018;
originally announced May 2018.
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Local tuning of photonic crystal cavities using chalcogenide glasses
Authors:
Andrei Faraon,
Dirk Englund,
Douglas Bulla,
Barry Luther-Davies,
Benjamin J. Eggleton,
Nick Stoltz,
Pierre Petroff,
Jelena Vuckovic
Abstract:
We demonstrate a method to locally change the refractive index in planar optical devices by photodarkening of a thin chalcogenide glass layer deposited on top of the device. The method is used to tune the resonance of GaAs-based photonic crystal cavities by up to 3 nm at 940 nm, with only 5% deterioration in cavity quality factor. The method has broad applications for postproduction tuning of ph…
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We demonstrate a method to locally change the refractive index in planar optical devices by photodarkening of a thin chalcogenide glass layer deposited on top of the device. The method is used to tune the resonance of GaAs-based photonic crystal cavities by up to 3 nm at 940 nm, with only 5% deterioration in cavity quality factor. The method has broad applications for postproduction tuning of photonic devices.
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Submitted 8 November, 2007; v1 submitted 5 November, 2007;
originally announced November 2007.
