Oxygen vacancy engineering of TaOx-based resistive memories by Zr doping for improved variability and synaptic behavior
Authors:
Joao H. Quintino Palhares,
Yann Beilliard,
Fabien Alibart,
Everton Bonturim,
Daniel Z. de Florio,
Fabio C. Fonseca,
Dominique Drouin,
Andre S. Ferlauto
Abstract:
Resistive switching devices are promising emerging non-volatile memories. However, one of the biggest challenges for resistive switching (RS) memory applications is the device-to-device (D2D) variability which is related to the intrinsic stochastic formation and configuration of oxygen vacancy (VO) conductive filaments. In order to reduce D2D variability, the control of oxygen vacancy formation an…
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Resistive switching devices are promising emerging non-volatile memories. However, one of the biggest challenges for resistive switching (RS) memory applications is the device-to-device (D2D) variability which is related to the intrinsic stochastic formation and configuration of oxygen vacancy (VO) conductive filaments. In order to reduce D2D variability, the control of oxygen vacancy formation and configuration is paramount. We report in this study Zr doping of TaOx-based RS devices prepared by pulsed laser deposition (PLD) as an efficient mean to reduce VO formation energy and increase conductive filament (CF) confinement, thus reducing D2D variability. Such findings were supported by X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry (SE) and electronic transport analysis. Zr doped films presented increased VO concentration, and more localized VO thanks to the interaction with Zr. According to DC and pulse mode electrical characterization, D2D variability was decreased by a factor of 7, resistance window was doubled and a more gradual and monotonic long-term potentiation/depression (LTP/LTD) in pulse switching was achieved in forming-free Zr:TaOx devices thus displaying promising performance for artificial synapse applications.
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Submitted 22 April, 2021; v1 submitted 16 December, 2020;
originally announced December 2020.
